[ccp4bb]: NCS and solvent flattening

[Eeva Leinala <eeva@crystal.biochem.queensu.ca>]

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Hello all - this is a CNS and NCS question that I hope someone can help 
me with!!

	I have a case of 4 fold NCS and would like to use it during 
density modification and solvent flattening in CNS.  The NCS matrices 
have been identified and I have generated a mask (using the CNS program 
model_mask.inp)of one of the NCS related regions.  However, when I feed 
this into my denstiy modifcation run, the program "pauses" after 
remapping the mask to the current grid:


 XMSKORD: remapping mask to current grid
 XMSKORD: from extent NA=( 120 34 185) NB=( 120 15 141) NC=( 60-115 100)
 XMSKORD:  to extent NA=( 240 67 371) NB=( 240 29 283) NC=( 150-288 251)
 XMSKORD: total # points inside mask 152808 total # points outside
mask40048116
 
 XMSKORD-WRN: the mask overlaps itself by     .0%


Clearly, there is a problem in that the program does not like the fact 
that the masks overlap by 0%, however the solvent content of my crystal 
is 70%.
Should I try and increase my mask size by including regions of the 
solvent area in my NCS mask??? 

????

Thank you for any help or suggestions!

Cheers,
Eeva Leinala

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		Eeva Leinala 
		Graduate Student 
		Queen's University, Kingston, ON, Canada
		Department of Biochemistry
		Laboratory of Dr. Z. Jia

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